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  • Mary Benner and Joel Waldfogel, "Close to You? Bias and Precision in Patent-Based Measures of Technological Proximity," NBER Working Paper 13322 (2007), https://doi.org/10.3386/w13322.

Published Versions

Benner, Mary & Waldfogel, Joel, 2008. "Close to you? Bias and precision in patent-based measures of technological proximity," Research Policy, Elsevier, vol. 37(9), pages 1556-1567, October. citation courtesy of

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